Electrical Breakdown
Specific physical processes within a semiconductor lead to the permanent loss of function or the drift of operating parameters. Categorizing silicon failure modes allows engineers to predict the reliability of a device and design protection circuits to mitigate these risks. These events often stem from high voltage transients, excessive current density, localized overheating or the migration of atoms within the crystal lattice.
Physical Degradation
Electromigration occurs when high current densities cause the metal atoms in the interconnects to move, eventually creating an open circuit or a short. Another common issue is hot carrier injection where electrons gain enough energy to cross the barrier and become trapped in the gate oxide. Both mechanisms are accelerated by high temperatures and lead to a gradual shift in the switching speed of the transistors.
These shifts are tracked during accelerated aging tests.
Dielectric Failure
Time-dependent dielectric breakdown represents the sudden rupture of the insulating layer under a constant electric field. This is a wear-out phenomenon that limits the lifetime of the chip regardless of the operating environment. Monitoring the leakage current over thousands of hours of stress testing helps to establish the safe operating voltage limits for the technology.
Thermal Limit
Overheating causes the formation of voids or the melting of the solder bumps that connect the die to the package. These thermal events often result from localized hotspots where the power dissipation exceeds the cooling capacity of the heat sink. Reliable designs include thermal sensors that trigger a shutdown before the critical damage threshold is reached.