Compositional Quality
Material cleanliness in thin film deposition ensures that sputtered layers possess the intended electrical and optical properties. Magnetron target purity measures the concentration of the primary element relative to trace contaminants like iron or sodium. Even small amounts of unwanted atoms can shift the resistivity of a semiconductor film.
Verification Method
Glow discharge mass spectrometry identifies the exact parts per million of impurities within a metal or ceramic block. This analysis allows manufacturers to certify magnetron target purity for high precision applications. A certificate of analysis usually lists the gaseous and metallic contents found during the melt.
Deposition Impact
Contaminants trapped in the plasma stream migrate to the substrate and alter the grain structure of the coating. High magnetron target purity reduces the frequency of arc events that cause spitting and film defects. It is common for high performance sensors to require targets with 99.999 percent metallic purity.
Sourcing Protocol
Procurement specifications define the acceptable limits for specific harmful elements that could poison the manufacturing process. Suppliers must demonstrate that magnetron target purity is maintained from the raw ingot through the final machining stages. Handling and vacuum packaging prevent surface contamination after the final cleaning step.
Any breach in the seal during transport necessitates a requalification of the target surface before it enters the production chamber.
